Ultraviolet Laser Marking Machine (GS-UV3M)

Description

System Features

  • Processing fine, high yield
  • Widely applications to materials
  • Small heat-affected area to avoid damage to the material being processed
  • Marking speed,high efficiency,high-precision
  • No supplies, low maintenance cost
  • stabie performance

 

Applications

  • LCD Screen, plasma screen marking
  • Thin ceramic marking
  • Silicon chips marking
  • IC grain marking
  • polymer film marking
  • CD-ROM and other high value-added products, marking

 

Advantages

  • Laser beam quality, focus spot small, small heat affected zone
  • Narrow pulse width, short wave length, large single-photon energy
  • Wide range of applications
  • Powerful software, and can be customized according to customer
  • Water-cooled design, more stability
Model GS-UV3M GS-UV5M
Wavelangth 355nm
Laser power 3W@30KHz 5W@30KHz
Beam quality MI〈 1.2
Pulse Repetition Rate 10-120KHz
Bea Diameter 1.0±0.1mm
Marking speed ≤7000mm/s
Marking area 50mmx50mm-300mmx300mm
Marking width 0.012mm
Minimum char actar 0.15mm
Repaatability ±0.01
Cooling mode Air cooling
System operation envirnment Win XP/Win 7 32bit
Power requir ement 220V/20A/50Hz
Power 800-1000W
Size 1150mmx1190mmx1600mm

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